Index
A
B
C
D
- Data skew:
Section 3: Chapter 2
- Defect:
Section 3: Chapter 2,
Section 4: Introduction,
Section 4: Chapter 3,
Section 4: Chapter 3,
Section 4: Chapter 3,
Section 4: Chapter 4
- Degradation:
Section 4: Chapter 1
- Delta measurements:
Section 4: Chapter 2
- Department of defense (DoD):
Appendix 2
- DESC:
Section 4: Chapter 4,
Section 4: Chapter 4,
Appendix 2,
Appendix 2.
- Design:
Section 1: Chapter 1,
Section 1: Chapter 2,
Section 3: Chapter 2
- Design cycle:
Appendix 1
- Device (or process) learning factor:
Appendix 7
- DFT. See Design: for test
- Die shear test:
Section 4: Chapter 3
- Die-attach:
Section 4: Chapter 1
- Doping profile:
Section 4: Chapter 1
E
F
G
H
I
- I/O:
Section 3: Chapter 2,
Section 3: Chapter 2
- IDD current limiting:
Section 3: Chapter 4
- IDDQ testing:
Section 2: Chapter 5,
Section 3: Chapter 2,
Section 4: Chapter 1,
Section 4: Chapter 4
- IEEE standard 1149.1:
Section 3: Chapter 3,
Section 3: Chapter 3,
Appendix 1
- Implementation:
Section 3: Chapter 2
- In-line tests:
Section 4: Chapter 4
- In-process monitoring:
Appendix 2
- Infant mortality:
Section 4: Chapter 3,
Section 4: Chapter 3,
Section 4: Chapter 3,
Section 4: Chapter 3,
Appendix 7
- Information management:
Section 1: Chapter 4
- Interconnections:
Section 3: Chapter 2,
Section 3: Chapter 2
- Interface traps:
Section 3: Chapter 2
- Ionizing radiation:
Section 3: Chapter 2
J
L
M
- Marking Diagram:
Appendix 6
- Mask:
Section 4: Chapter 4
- Metal stress voiding:
Section 4: Chapter
1
- Metallization:
Section 4: Chapter 1,
Section 4: Chapter 4
- MIL-H-38534:
Section 4: Chapter 1
- MIL-HDBK-217:
Appendix 7,
Appendix 7
- MIL-I-38535:
Section 4: Chapter 1,
Section 4: Chapter 3,
Section 4: Chapter 3,
Appendix 2,
Appendix 2,
Appendix 3
- MIL-M-38510:
Appendix 2,
Appendix 3
- MIL-S-19500:
Appendix 2
- MIL-STD-750:
Appendix 2
- MIL-STD-883:
Section 2: Chapter 2,
Section 4: Chapter 1,
Section 4: Chapter 3,
Section 4: Chapter 3,
Appendix 1,
Appendix 2,
Appendix 3
- MIL-STD-976:
Appendix 2
- MIL-STD-977:
Section 4: Chapter 1
- Modeling:
Section 4: Chapter 2
- Multi-chip devices:
Section 4: Chapter
1
- Multiple-bit upset:
Section 3: Chapter 4
N
O
P
- Packaging:
Section 1: Chapter 3,
Section 3: Chapter 2,
Section 3: Chapter 2,
Section 4: Chapter 1. See also
Vendor evaluation: evaluating packaging
- Parametric monitor (PM):
Appendix 2
- Parasitic bipolar transistor:
Section 3: Chapter 4
- Part acceptance:
Section 1: Chapter 1,
Section 1: Chapter 2,
Section 4: Chapter 4
- Part count method:
Appendix 7
- Part stress analysis method:
Appendix 7
- Partitioning:
Section 3: Chapter 2,
Section 3: Chapter 2,
Section 3: Chapter2
- PDA:
Section 4: Chapter 3,
Section 4: Chapter 3,
Appendix 4
- Percent defective allowable. See PDA
- Performance:
Section 3: Chapter 2
- Physical layout:
Section 1: Chapter1
- Pin Assignment:
Appendix 6
- Place and route:
Appendix 1
- Planning
- Post-layout
- Power cycling:
Section 3: Chapter 4
- Power dissipation: Section 3: Chapter 2
- Preliminary design review (PDR). See review process: preliminary design
review
- Process:
Section 4: Chapter 3,
Section 4: Chapter 3
- Process (or device) learning factor:
Appendix 7
- Process control:
Section 4: Chapter 3. See
also Statistical process control
- Process maturity:
Section 2: Chapter 3
- Process monitor:
Section 4: Chapter 1
- Process technology:
Section 2: Chapter 3
- Process variation:
Section 4: Chapter 2
- Procurement:
- Program budgeting. See ASIC:
program: budgeting
- Proof-of-design parts:
Section 4: Chapter 1
- Propagation delay:
Section 4: Chapter 1
- Prototype:
Section 4: Chapter 1,
Section 4: Chapter 2
- Punchthrough:
Section 4: Chapter 1
Q
- QCI:
Section 4: Chapter 2,
Section 4: Chapter 2,
Section 4: Chapter 3,
Section 4: Chapter 3,
Section 4: Chapter 3,
Section 4: Chapter 3
- QML:
Section 2: Chapter 2,
Section 4: Introduction,
Section 4: Chapter 1,
Section 4: Chapter 1,
Section 4: Chapter 3,
Section 4: Chapter 3,
Section 4: Chapter 3,
Section 4: Chapter 3,
Section 4: Chapter 3,
Section 4: Chapter 3,
Section 4: Chapter 4,
Appendix 1,
Appendix 4. See also Government qualification programs;
Screening: QML and QPL methods
- QMP. See Quality Management Plan
- QPL:
Section 2: Chapter 2,
Section 4: Introduction,
Section 4: Chapter 1,
Section 4: Chapter 1,
Section 4: Chapter 3,
Section 4: Chapter 3,
Section 4: Chapter 3,
Section 4: Chapter 3,
Section 4: Chapter 3,
Section 4: Chapter 3,
Section 4: Chapter 4,
Appendix 1,
Appendix 4. See also Government qualification programs;
Screening: QML and QPL methods
- Qualified Manufacturers Listing. See QML
- Qualified Parts Listing. See QPL
- Quality:
Section 4: Introduction
- Quality assurance:
Section 4:
Introduction
- Quality conformance inspection. See QCI
- Quality factor:
Appendix 7
- Quality Management Plan (QMP):
Section 2: Chapter 2,
Appendix 2
- Quiescent current:
Section 3: Chapter 2,
Section 4: Chapter 1
R
S
- Sacrificial package test:
Section 4: Chapter 1
- Scan design:
Section 3: Chapter 2,
Section 3: Chapter 3
- Scan path:
Section 3: Chapter 3
- Scan/set logic:
Section 3: Chapter 3
- Scanning electron microscope:
Section 4: Chapter 1
- Schematic capture:
Section 3: Chapter 2
- Schematic correlation:
Section 3: Chapter
2
- Screening:
Section 4: Introduction,
Section 4: Chapter 1,
Section 4: Chapter 2,
Section 4: Chapter 2,
Section 4: Chapter 3,
Section 4: Chapter 3,
Section 4: Chapter 3
- SEC. See Standard evaluation circuit
- SEE:
Section 4: Chapter 2,
Appendix 3
- Shift register:
Section 3: Chapter 2,
Section 3: Chapter 2,
Section 3: Chapter 2
- SHMOO plots:
Section 4: Chapter 2
- Signature analysis:
Section 3: Chapter 3
- Silicon on insulator (SOI):
Section 3: Chapter 4,
Section 3: Chapter 4
- Silicon-on-sapphire (SOS):
Section 3: Chapter 4
- Simulation:
Section 3: Chapter 2
,
Appendix 1
- Simulation/verification tools
- Simulator:
Section 4: Chapter 2,
Appendix 1
- Single-Event Effects (SEE):
Section 3: Chapter 4
- Single-event transients:
Section 3: Chapter 4:
- Single-event upset:
Section 3: Chapter 4
- Slash sheet:
Section 4: Chapter 3,
Appendix 2,
Appendix 2
- Snapback:
Section 3: Chapter 4
- Soft macro:
Section 2: Chapter 4
- SPC. See Statistical process
control
- Specification:
Section 1: Chapter 4,
Section 3: Chapter 1,
Section 4: Chapter 1,
Section 4: Chapter 1,
Section 4: Chapter 3
- Specification, technical
- SPICE:
Appendix 1
- Standard cell:
Section 2: Chapter 3
Section 3: Chapter 2
- Standard evaluation circuit (SEC):
Appendix 2
- Standardized military drawing (SMD):
Appendix 2
- Standby current:
Sectin 4: Chapter 2
- State capture, multiple device:
Section 3: Chapter 2
- Statistical process control:
(SPC):
Section 4: Chapter 3,
Appendix 2
- Step coverage:
Section 4: Chapter 1
- Structural test:
Section 2: Chapter 5
- Stuck-at fault:
Section 3: Chapter 2,
Section 3: chapter 3,
Section 4: Chapter 1,
Section 4: chapter 1,
Section 4: Chapter 4
- Subsystem characterization. See Characterization: system
- Support groups
- Surface-mount technology:
Section 3: Chapter 3
- Synthesis:
Appendix 1. See HDLs: and synthesis
- System
T
- Tasks
- TCI:
Section 4: Chapter 3,
Section 4: Chapter 3
- Technical evaluation:
Section 2:
Introduction
- Technology characterization vehicle (TCV):
Appendix 2
- Technology conformance inspection. See TCI
- Technology review board (TRB):
Section 4: Chapter 3,
Appendix 2
- Temperature acceleration factor:
Appendix 7
- Temperature cycling:
Section 4: Chapter 2,
Section 4: Chapter 3
- Test:
Section 3: Chapter 2,
Section 3: Chapter 2,
Section 4: Chapter 1
- access port (TAP):
Section 3: Chapter 3
- and characterization:
Section 1: Chapter 1
- at-speed functional:
Section 4: Chapter 1,
Section 4: Chapter 1. See also
Fault models: at-speed functional
- data standards:
Section 3: Chapter 3
- designer support of:
Section 4: Chapter 1
- die holder tests:
Section 4: Chapter 1
- fault detection and localization (FDL), IEEE
PAR f:
Section 3: Chapter 3
- generation:
Section 3: Chapter 2
- generation tools:
Section 2: Chapter 5
- I/O:
Section 3: Chapter 3
- IDDQ:
Section 4: Chapter 1. See
also IDDQ testing
- internal:
Section 3: Chapter 3
- need for more than one type of:
Section 4: Chapter 1
- requirements and specification language
(TRSL):
Section 3: Chapter 3
- structure:
Section 4: Introduction,
Section 4: Chapter 1,
Section 4: Chapter 3,
Section 4: Chapter 3
- stuck at fault. See Stuck at fault
- testability:
Section 2: Chapter 3,
Section 2: Chapter 4
- tester limitations:
Section 4: Chapter 1
- to failure:
Section 4: Chapter 2
- transient ionizing irradiation:
Section 4: Chapter 3
- vectors:
Section 3: Chapter 2,
Section 4: Chapter 1,
Section 4: Chapter 1,
Section 4: Chapter 2,
Section 4: Chapter 3,
Section 4: Chapter 3
- TID:
Section 4: Chapter 2,
Section 4: Chapter 3,
Appendix 3
- Time to market:
Section 3: Chapter 2
- Time-dependent dielectric breakdown (TDDB):
Section 4: Chapter 1,
Sectin 4: Chapter 3
- Timing
- Toggle coverage:
Section 3: Chapter 2
- Tools:
Section 1: Chapter 2,
Section 2: Chapter 2,
Section 4: Chapter 4
- Total Ionizing Dose (TID):
Section 3: Chapter 4
- Total Quality Management (TQM):
Appendix 2
- Transient analyses:
Appendix 1
- Transient phenomena:
Section 3: Chapter 4
- Transistor-transistor logic:
Section 3: Chapter 2
- Translation:
Appendix 1,
Appendix 1. See also Modeling: and translation
- Translators:
Appendix 1
- TRSL. See Test: requirements and specification
language
- Tunneling:
Section 4: Chapter 1
V
W
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